Arca Arca
      Ca’ Foscari Metasearch    |    Open Access Journals (DOAJ)    |    Open Access Repositories (ROAR)    |    Linguistics Resources

Arca >
Archivio della Ricerca Ca' Foscari >
2 Contributo su rivista >
2.1 Articolo su rivista >

Utilizza questo identificativo per citare o creare un link a questo documento: http://hdl.handle.net/10278/44852

Titolo: Electrochemical properties of stoichiometric RuN film prepared by rf-magnetron sputtering: A preliminary study
Autore⁄i: BATTAGLIN, Giancarlo
Data di pubblicazione: 2014
Tipo di documento: 2.1 Articolo su rivista
Fa parte di : ELECTROCHEMISTRY COMMUNICATIONS
Abstract: The electrochemical properties and stability of ruthenium mononitride (RuN) thin films were studied. Coatings of RuN were synthesized on electropolished titanium supports by rf-magnetron sputtering. RuN electrodes appear rather stable against dissolution, independently of pH, but show to possess the greatest stability only in alkaline environment. Under hydrogen evolution conditions the films show relevant catalytic properties, comparable with Pt, Pd and Ru/Ir derivatives; a significant coverage by adsorbed reaction intermediates is involved. These electrodes are of potential application in energetics and sensoring.
Lingua del testo: eng
Keywords: ruthenium mononitride
Hydrogen evolution
thin film stlity
adsorbed intermediates
Rf magnetron sputtering
Accessibilità del testo pieno: reserved
In2 Contributo su rivista >2.1 Articolo su rivista

Full text:

File Descrizione DimensioniFormatoConsultabilità
RuN-ElectrochemComm.pdfAbstract1,15 MBAdobe PDFnon consultabile Visualizza/apri

Tutti i documenti archiviati in Arca sono protetti da copyright. Tutti i diritti riservati.

 

Surplus-OA ICT Support, development & maintenance are provided by CINECA. Powered on DSpace Software. Surplus-OA